PROCESS
Small Signal
MOSFET
CP359R
N-Channel Enhancement-Mode
MOSFET Chip
PROCESS DETAILS Die Size Die Thickness Gate Bonding Pad Area Source Bonding Pad Area Top Side Metalization Back Side Metalization 9.
1 x 9.
1 MILS 3.
9 MILS 2.
5 MILS DIAMETER 3.
9 x 3.
9 MILS Al-Si - 30,000Å Au - 12,000Å
GEOMETRY GROSS DIE PER 6 INCH WAFER 290,000 PRINCIPAL DEVICE TYPE CMRDM3590
R0 (13-May 2010)
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PROCESS
CP359R
Typical Electrical Characteristics
R0 (13-May 2010)
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